Collect. Czech. Chem. Commun.
1995, 60, 372-382
https://doi.org/10.1135/cccc19950372
Adsorption and Thermal Decomposition of Tetrakis(dimethylamido)titanium on Si and SiO2/Si Surfaces: an XPS Study
Michaela Janovská and Zdeněk Bastl
J. Heyrovský Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, 182 23 Prague 8, Czech Republic
Crossref Cited-by Linking
- Djomeni Larissa, Mourier Thierry, Minoret Stéphane, Fadloun Sabrina, Piallat Fabien, Burgess Steve, Price Andrew, Zhou Yun, Jones Christopher, Mathiot Daniel, Maitrejean Sylvain: Study of low temperature MOCVD deposition of TiN barrier layer for copper diffusion in high aspect ratio through silicon vias. Microelectronic Engineering 2014, 120, 127. <https://doi.org/10.1016/j.mee.2013.11.010>
- Rodríguez-Reyes Juan Carlos F., Teplyakov Andrew V.: Chemisorption of Tetrakis(dimethylamido)titanium on Si(100)-2 × 1: C−H and C−N Bond Reactivity Leading to Low-Temperature Decomposition Pathways. J. Phys. Chem. C 2008, 112, 9695. <https://doi.org/10.1021/jp800436w>
- Rodríguez‐Reyes Juan Carlos F., Teplyakov Andrew V.: Chemistry of Organometallic Compounds on Silicon: The First Step in Film Growth. Chemistry A European J 2007, 13, 9164. <https://doi.org/10.1002/chem.200700856>
- Rodríguez-Reyes Juan Carlos F., Teplyakov Andrew V.: Chemistry of Diffusion Barrier Film Formation: Adsorption and Dissociation of Tetrakis(dimethylamino)titanium on Si(100)-2 × 1. J. Phys. Chem. C 2007, 111, 4800. <https://doi.org/10.1021/jp067929b>
- Janovská M., Bastl Z.: IR laser induced decomposition of tetrakis(dimethylamido)titanium for chemical vapor deposition of TiNx. Infrared Physics & Technology 1996, 37, 727. <https://doi.org/10.1016/S1350-4495(96)00006-0>